Laboratory located in clean rooms to facilitate micro-nanomanufacturing processes, which require airborne particle contamination to be controlled and kept at low levels so that work can be carried out in a systematic and conclusive manner.
The handling of nanomaterials also requires the use of an enclosed, controlled area.
Description
The equipment available in the laboratory includes:
- Spin-spray coater. Equipment for deposition processes with a controlled thickness of the deposited layer.
- EVG 620 Mask Aligner lithography equipment for defining micro- and nanometre-sized structures (up to about 100 nm). Techniques: Photolithography, UV Nil and micro contact printing.
- Dispermat SL12-C VMA-Getzmann horizontal bead mill with a zirconium oxide grinding system and a 1-l double-walled stainless steel container. Nanoparticle dispersions of less than 1 micron can be achieved.
- Plasmalab 80plus (Oxford Instruments) plasma etcher: reactive-ion etching (RIE) equipment for the attack of metal oxides, Ti, photoresins.
- Ultra pure water accessible at various points. The water purification system consists of 2 Elix5 UV and Milli-Q IQ Element modules.
- Fume cupboards for handling solvents.
- Olympus BS51 optical microscope with polarised light, differential interference contrast (DIC) (Nomarski) and fluorescence.
- Size separation system based on an Asymmetrical flow field-flow fractionation (AF4) channel coupled to a MALS detector (WYATT Technologies), which makes it possible to characterise the size distribution of nanomaterials in a solution, particle diameters and concentration.
Aimed at:
- Research groups and companies to carry out R&D and innovation based on applying micro and nanotechnologies and manufacturing processes hosted in a clean environment to achieve innovative solutions.
