TECNALIA obtains the Portuguese R&D SEAL recognition

3 May 2023
TECNALIA ha obtenido el SELO I+D (SIFIDE)

“We are making a qualitative leap towards improving the social and economic impact on the Portuguese industrial sector”

The Portuguese National Innovation Agency recognises TECNALIA as an R&D entity

TECNALIA has obtained the R&D SEAL (SIFIDE) awarded by the Portuguese National Innovation Agency (ANI). This recognition by ANI endorses TECNALIA's good work and competence as a technology centre dedicated fundamentally to research and development in such diverse fields as construction, health, mobility, energy and a long etcetera that forms part of our activity.

SIFIDE is a Portuguese government programme which aims to promote investment in R&D in the business sector, providing tax incentives to boost technological development in Portugal. The R&D Seal is a tool that recognises companies complying with the programme requirements and demonstrating an effective commitment to carrying out R&D activities.

Advantages of this recognition

The main advantage of this recognition is directly transferred to the Portuguese industry, so that any collaboration of a company with TECNALIA is rewarded with tax incentives; this collaboration can be part of a consortium project or even an internal R&D project of a single company.

TECNALIA is listed as an R&D provider and therefore, by opening the period for submitting applications to the system of tax incentives for business R&D (SIFIDE), the company recovers part of the initial investment.